US Patent 8907277B2
Reducing particle implantation
Lawrence Scipioni Co-Inventor
Reducing particle implantation
Lawrence Scipioni Co-Inventor
Details of Patent
This patent is for methods of reducing particle implantation. It relates to particle beams and particle implantation in samples. Samples can be exposed to particle beams for a variety of applications, including sample characterization, sample modification, and particle beam characterization. Exposure of a sample to a particle beam can lead to implantation of particles in the sample.
The Methods comprise:
(a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample;
(b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and
(c) forming an image of the sample based on particles that leave the surface.
This patent is for methods of reducing particle implantation. It relates to particle beams and particle implantation in samples. Samples can be exposed to particle beams for a variety of applications, including sample characterization, sample modification, and particle beam characterization. Exposure of a sample to a particle beam can lead to implantation of particles in the sample.
The Methods comprise:
(a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample;
(b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and
(c) forming an image of the sample based on particles that leave the surface.
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