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October 3, 2024
Carbon Films Processed With Novel CVD Technique Could Finally Make Quantum Device Production Scalable
Carbon Films Processed With Novel CVD Technique Could Finally Make Quantum Device Production Scalable
Quantum devices could finally become widely available thanks to a new advanced carbon film that has longer electron spin duration and can be processed into quantum devices using standard semiconductor fabrication techniques. The company that brought about this innovation is Archer Materials, a semiconductor company based out of Australia. Layered carbon nanostructures known as carbon nano-onions (CNOs) demonstrate properties that are important for the creation of qubits and developing faster electronic components. These properties include stable electron spins for longer durations and excellent electrical conductivity. However, in the past there have been significant limitations that did not allow for the large-scale production of CNOs, consequently quantum devices could not be produced at scale either. Nevertheless, Archer Materials suggests this is about to change, thanks to their new carbon films, which they say could potentially make CNO production scalable. They developed a proprietary chemical vapor deposition method process which can deposit carbon films on substrates such as silicon. The process is very efficient and clean, resulting in extremely low levels of impurities. However, the company notes that creating CNOs is still an ongoing challenge. Greg English, executive chair of Archer said, “Manufacturability of many quantum materials is an ongoing challenge in the field. Working on this new film, alongside CNOs or even in place of CNOs, will accelerate the development of our quantum technology and provide a means of volume manufacturing of such devices”. Learn more here.
October 19, 2024
New Vapor Deposition Technique Boosts Flexible Device Production
New Vapor Deposition Technique Boosts Flexible Device Production
A team of researchers developed a new printing-based selective metal film deposition technique that will enable significantly faster flexible electronic device manufacturing. The team included researchers from Seoul National University and the Daegu Gyeongbuk Institute of Science. Vapor deposition is commonly used in electronics manufacturing, its ability to produce metal thin films with superior properties makes it a vital process for the fabrication of electronic circuits and devices. However, the fabrication of electronics often requires that the metal thin films be shaped into certain forms. This usually requires the use of stiff masks such as shadow masks or photo masks. But there is a particular limitation caused by the use of stiff masks, which is that pattern modification becomes more challenging due to the limitation of range procedures that can be performed on different types of surfaces, which is a direct consequence of using the mask. Nevertheless, the new technique allows vapor deposition and patterning to happen at the same time without the need for a mask. This can be accomplished by using polymer patterns to keep the metal vapor from condensing. Consequently, the new method can create patterns with line lengths ranging from μm to mm on a large scale. Researchers noted that the new technique allows metal thin film patterns to be readily created on multi-curvature or elastic substrates. Throughout the project the team has experimented with using metal thin films in a variety of applications such as stretchy LED arrays, curvilinear OLEDs (Organic Light-Emitting Diodes), and wireless power transmission. Learn more about this topic here.