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March 20, 2025
NASA Develops Cutting-Edge Coating Techniques for UV Instrumentation
NASA Develops Cutting-Edge Coating Techniques for UV Instrumentation
Astrophysics observations in ultraviolet (UV) wavelengths unlock insights into some of the universe's most dynamic phenomena. However, the efficiency of UV instrumentation faces a challenge: the high energy of UV photons interacts inefficiently with traditional materials, reducing throughput. To tackle this, researchers at NASA's Jet Propulsion Laboratory (JPL) are developing cutting-edge coating techniques using atomic layer deposition (ALD) and atomic layer etching (ALE).
These methods differ from conventional physical vapor deposition (PVD) by employing self-limiting chemical reactions to add or remove material at the atomic scale. This precision ensures uniform coatings over intricate structures, enabling enhanced performance at UV wavelengths.
The advancement of fluoride-based materials, critical for UV applications, is key. For instance, aluminum is a popular choice for UV reflectors due to its high intrinsic reflectance, but its surface oxide absorbs UV light. JPL's coatings utilize metal fluorides, like lithium fluoride, to protect aluminum from oxidation while maintaining transparency. To mitigate lithium fluoride’s moisture sensitivity, JPL developed an ultrathin magnesium fluoride top layer via ALD, boosting stability without compromising UV performance.
These innovations enhance instruments for missions like SPRITE and Aspera, enabling UV observations beyond the capabilities of Hubble. Furthermore, JPL's custom vacuum systems combine PVD and ALD processes to create UV bandpass filters, recently delivered for the SPARCS mission. These filters provide high UV efficiency and minimal visible light interference, setting the stage for future breakthroughs, such as the UVEX mission. Learn more about this topic here.
These methods differ from conventional physical vapor deposition (PVD) by employing self-limiting chemical reactions to add or remove material at the atomic scale. This precision ensures uniform coatings over intricate structures, enabling enhanced performance at UV wavelengths.
The advancement of fluoride-based materials, critical for UV applications, is key. For instance, aluminum is a popular choice for UV reflectors due to its high intrinsic reflectance, but its surface oxide absorbs UV light. JPL's coatings utilize metal fluorides, like lithium fluoride, to protect aluminum from oxidation while maintaining transparency. To mitigate lithium fluoride’s moisture sensitivity, JPL developed an ultrathin magnesium fluoride top layer via ALD, boosting stability without compromising UV performance.
These innovations enhance instruments for missions like SPRITE and Aspera, enabling UV observations beyond the capabilities of Hubble. Furthermore, JPL's custom vacuum systems combine PVD and ALD processes to create UV bandpass filters, recently delivered for the SPARCS mission. These filters provide high UV efficiency and minimal visible light interference, setting the stage for future breakthroughs, such as the UVEX mission. Learn more about this topic here.
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